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공공누리This item is licensed Korea Open Government License

Title
Molecular dynamics study on the effects of stamp shape, adhesive energy, and temperature on the nanoimprint lithography process
Author(s)
강지훈김경웅김광섭
Publication Year
2010-12-15
Abstract
Molecular dynamics simulations of nanoimprint lithography (NIL) were performed to investigate the effects of three critical process parameters in NIL: stamp shape, adhesive energy between the stamp and polymer film, and imprint temperature. The proposed simulation model of the NIL process consists of an amorphous SiO2 stamp with a line pattern, an amorphous poly(methylmethacrylate) film, and a Si substrate under the periodic boundary condition in the horizontal direction to simulate a real NIL
Keyword
Molecular dynamics simulation; Nanoimprint lithography; Stamp shape; Adhesive energy; Imprint temperature
Journal Title
Applied surface science
Citation Volume
257
ISSN
0169-4332
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Appears in Collections:
7. KISTI 연구성과 > 학술지 발표논문
URI
https://repository.kisti.re.kr/handle/10580/13857
http://www.ndsl.kr/ndsl/search/detail/article/articleSearchResultDetail.do?cn=NART54694879
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