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공공누리This item is licensed Korea Open Government License

dc.contributor.author
HongguangLiu
dc.contributor.author
이진용
dc.date.accessioned
2019-08-28T07:41:10Z
dc.date.available
2019-08-28T07:41:10Z
dc.date.issued
2012-09-26
dc.identifier.issn
0192-8651
dc.identifier.uri
https://repository.kisti.re.kr/handle/10580/14050
dc.identifier.uri
http://www.ndsl.kr/ndsl/search/detail/article/articleSearchResultDetail.do?cn=NART65371235
dc.description.abstract
Weprovideanovelstrategytoeliminatetheepoxygroupfrom
thebasalplaneofgrapheneplatelets.Giventhatthecurrent
reductionmethodsareunsatisfactorytocleantheepoxidesor
sometimescauseundesirablestructuredeformations,the
proposedstrategyrestorestheoriginalhexagonalcarbon
networkwithoutcreatingothernewdefects.Tothebestofour
knowledge,theelectricfieldmediatedgrapheneoxide(GO)reductionhasnotyetbeensystematicallyinvestigated.The
capabilitywouldpermittheimprovementofexistingGO
reductionmethodsandassistinthefabricationofhigh-quality
graphiticmaterials.
dc.language
eng
dc.relation.ispartofseries
Journalofcomputationalchemistry
dc.title
Electric Field Assisted Oxygen Removal from the Basal Plane of the Graphitic Material
dc.citation.endPage
310
dc.citation.number
4
dc.citation.startPage
305
dc.citation.volume
34
dc.subject.keyword
Oxygenremoval
dc.subject.keyword
Basaplane
dc.subject.keyword
Graphiticmaterial
Appears in Collections:
7. KISTI 연구성과 > 학술지 발표논문
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